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90 nm

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Currently, the industry uses 193-nanometer-wave-length laser radiation to make wires and other circuit parts as thin as 90 nm.
SAXS measurements were performed at the Advanced Photon Source at Argonne National Laboratory on test arrays of lithographically prepared structures with dimensions spanning 90 nm to 300 nm with a precision on the order of 0.
The 90 nm process will be ramped into high volume in Intel's 300 mm development fab in Hillsboro, Oregon, and then transferred to Ireland and other 300mm manufacturing fabs sometime next year.
 
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