chemical vapor deposition

(redirected from Atmospheric Pressure CVD)
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chemical vapor deposition

[′kem·i·kəl ¦vā·pər ‚dep·ə′zish·ən]
(solid-state physics)
The growth of thin solid films on a crystalline substrate as the result of thermochemical vapor-phase reactions. Abbreviated CVD.
References in periodicals archive ?
In 2009, OKI Engineering delivered the KGT-3MM-AP to ON Semiconductor for the first time, as an exhaust gas processor for Amaya continuous atmospheric pressure CVD manufacturing equipment," says Yutaka Asai, President of OKI Engineering.
OKI Engineering has added a newly developed function as an option, which resets abnormalities in the atmospheric pressure CVD equipment by detecting pressure abnormality occurred during maintenance, in turn, enhancing customer satisfaction.
In the manufacture of power devices such as Power FET and IGBT atmospheric pressure CVD manufacturing equipment is vital at the stage of insulating film manufacture.
OKI Engineering 's KGT-3MM-AP exhaust gas treatment contains a special stainless steel filter, which minimizes filter clogging and helps remove the harmful gases and particulate matter used with atmospheric pressure CVD manufacturing equipment.
Aviza offers both front-end-of-line (FEOL) and back-end-of-line (BEOL) process applications including products for atomic layer deposition (ALD), diffusion and low pressure chemical vapor deposition (LPCVD) furnaces, atmospheric pressure CVD (APCVD), CVD, etch and physical vapor deposition (PVD).

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