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chemical vapor deposition

   Also found in: Acronyms, Wikipedia 0.01 sec.
chemical vapor deposition [′kem·i·kəl ¦vā·pər ‚dep·ə′zish·ən]
(solid-state physics)
The growth of thin solid films on a crystalline substrate as the result of thermochemical vapor-phase reactions. Abbreviated CVD.


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In addition to the new thermal deposition sources, Veeco's suite of solar technology solutions includes Metal Organic Chemical Vapor Deposition (MOCVD) systems for multi-junction solar cells and a complete suite of thin film and surface roughness metrology systems, including atomic force microscopes, stylus profilers and optical interferometer technology.
They found that, contrary to the expectations of some device manufacturers, the oxidation rate did not depend on whether the initial layers were grown by molecular beam epitaxy or metalorganic chemical vapor deposition (MOCVD), the two methods most commonly used by the industry.
Grades available include chemical vapor deposition (CVD), plasma-assisted chemical vapor deposition (PCVD) coated graders, cermet grades, and uncoated grades for aluminum and nonferrous materials.
 
 
 
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