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electron beam lithography
(redirected from E-beam lithography)

    Also found in: Wikipedia 0.01 sec.

electron beam lithography

Using electron beams to create the mask patterns directly on a chip. The wavelength of an electron beam is only a few picometers compared to the 248 to 365 nanometer wavelengths of light used to create the traditional photomasks.

Magnified 35,000 Times
The tiny lines on this silicon wafer were created using Lucent's SCALPEL electron beam lithography. The right-leaning lines are .08 microns wide. It would take 1,250 of them to equal the width of one human hair. (Image courtesy of Lucent Technologies.)



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com) makes quality control and defect analysis solutions and E-beam lithography systems for semiconductor manufacture.
Investors acquire Leica semi unit by Buetow, Mike / Circuits Assembly
Molecular Imprint's Imprio 1100 Precision Imprint Lithography System delivers a best-in-class solution to these challenges by combining the resolution and critical dimension (CD) control of e-beam lithography with the throughput, overlay and operating simplicity of a mask aligner -- all in a fully automated nano-imprint lithography system.
Molecular Imprints Expands Presence in Hard Disk Drive Market With ... by Business Wire
The Imprio 1100 Precision Imprint Lithography System represents the next generation in fully automated nano-imprint lithography combining the resolution and CD control of e-beam lithography with the throughput, overlay and operating simplicity of a mask aligner.
Molecular Imprints Announces the Imprio(R) 1100 Precision Imprint ... by Business Wire
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