electron beam lithography

(redirected from E-beam lithography)

electron beam lithography

Using electron beams to create the mask patterns directly on a chip. The wavelength of an electron beam is only a few picometers compared to the 248 to 365 nanometer wavelengths of light used to create the traditional photomasks.


Magnified 35,000 Times
The tiny lines on this silicon wafer were created using Lucent's SCALPEL electron beam lithography. The right-leaning lines are .08 microns wide. It would take 1,250 of them to equal the width of one human hair. (Image courtesy of Lucent Technologies.)
References in periodicals archive ?
Optaglio is a research organisation and the global leader in high-resolution e-beam lithography security holograms.
the project will focus on development of sensors and actuators based on non-conventional propagation of acoustic waves in artificial media, Electromagnetic/optical sensors based on metasurfaces, And advanced manufacturing technologies including 3d printing, Laser-micromachining technology, And e-beam lithography with the aim to provide practical solutions for the fabrication of novel acoustic and metasurface-based sensors and actuators.
The focused electron beam-irradiating unit may be from a scanning electron microscope, a transmission electron microscope, or an e-beam lithography system.
In addition to extreme ultraviolet lithography, Lin said that TSMC is also considering multi e-beam lithography technology for its 10nm FinFET process.
Many high quality fabrication techniques have been used for creation of CGH, including e-beam lithography [17, 18], photolithography [19, 20] or laser ablation [21, 22].
The SEM can also be equipped as a dual-column FIB or an e-beam lithography tool.
They describe recent applications such as transistors and e-beam lithography, then explain self-doped derivatives of polyaniline, including nanostructures.
The SEM can also be equipped as a dual column FIB or an e-beam lithography tool.
com) makes quality control and defect analysis solutions and E-beam lithography systems for semiconductor manufacture.
His current work includes e-beam lithography, optical trapping to assemble and test nanodevices, and subatomic displacement measurement.
The E-Beam lithography system will allow researchers to work at the equivalent level of nature's biological building blocks, by allowing them to create and research technologies at the cellular and subcellular level," notes Paul Maker, manager of JPL's Electron Beam Lithography Laboratory.