electron beam lithography

(redirected from E-beam lithography)
Also found in: Wikipedia.

electron beam lithography

Using electron beams to create the mask patterns directly on a chip. The wavelength of an electron beam is only a few picometers compared to the 248 to 365 nanometer wavelengths of light used to create the traditional photomasks.


Magnified 35,000 Times
The tiny lines on this silicon wafer were created using Lucent's SCALPEL electron beam lithography. The right-leaning lines are .08 microns wide. It would take 1,250 of them to equal the width of one human hair. (Image courtesy of Lucent Technologies.)
References in periodicals archive ?
Chiang has contributed to the research and development of CMOS, NMOS, Bipolar, DMOS, SOS, SOI, GaAs lasers, LED, E-Beam lithography, and silicon solar cells.
It manufactures and markets nano-patterned samples and templates using its own PHABLE tools and state-of-the-art e-beam lithography systems.
The focused electron beam-irradiating unit may be from a scanning electron microscope, a transmission electron microscope, or an e-beam lithography system.
In addition to extreme ultraviolet lithography, Lin said that TSMC is also considering multi e-beam lithography technology for its 10nm FinFET process.
Many high quality fabrication techniques have been used for creation of CGH, including e-beam lithography [17, 18], photolithography [19, 20] or laser ablation [21, 22].
They describe recent applications such as transistors and e-beam lithography, then explain self-doped derivatives of polyaniline, including nanostructures.
com) makes quality control and defect analysis solutions and E-beam lithography systems for semiconductor manufacture.
His current work includes e-beam lithography, optical trapping to assemble and test nanodevices, and subatomic displacement measurement.
The E-Beam lithography system will allow researchers to work at the equivalent level of nature's biological building blocks, by allowing them to create and research technologies at the cellular and subcellular level," notes Paul Maker, manager of JPL's Electron Beam Lithography Laboratory.
The device is covered by a PMMA-insulated layer, and e-beam lithography opens a window to expose part of the nanotube.
The company's Complementary E-Beam Lithography (CEBL) system augments optical lithography at critical layers by eliminating expensive optical multiple patterning at 20nm processing nodes and beyond.
It produces and markets nano-patterned wafers and templates using its unique EUV interference method and state-of-the-art e-beam lithography tools.