electron beam lithography


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electron beam lithography

Using electron beams to create the mask patterns directly on a chip. The wavelength of an electron beam is only a few picometers compared to the 248 to 365 nanometer wavelengths of light used to create the traditional photomasks.


Magnified 35,000 Times
The tiny lines on this silicon wafer were created using Lucent's SCALPEL electron beam lithography. The right-leaning lines are .08 microns wide. It would take 1,250 of them to equal the width of one human hair. (Image courtesy of Lucent Technologies.)
References in periodicals archive ?
Carbon nanotube nano-electrode array with vertical arrangement synthesized through the simple lithography method combined with RIE technique provides a cost-effective and simple replacement in comparison with electron beam lithography method in order to obtain electrode with an area of around 200 Eu 200 om2.
The E-Beam lithography system will allow researchers to work at the equivalent level of nature's biological building blocks, by allowing them to create and research technologies at the cellular and subcellular level," notes Paul Maker, manager of JPL's Electron Beam Lithography Laboratory.
Electron beam lithography (EBL), extreme ultraviolet lithography (EUVL), ion beam lithography (IBL), X-ray lithography (XRL), and nanoimprint lithography (NIL) have been developed during the years, but they did not make it to mass production.
By using an advanced electron beam lithography facility at the New Jersey Nanotechnology Consortium, the photonic crystal was deposited in a hexagonal pattern onto the semiconducting surface.
Tenders are invited for Electron beam lithography (ebl and imaging system
The Virtuagram is DNP's computer generated embossed hologram created using high definition electron beam lithography (see HN Vol 22, No 1).
The software is for Virtuagram[R], the company's high definition hologram with 360[degrees] views of the virtual object which is created by calculating the interference fringe data from 3D computer-generated data, with the interference patterns generated via an electron beam lithography system (see HN Vol 21, No 2).
One reason for Hudson's focus on Czech affairs is that the company sees a significant future for the group in industrial products manufactured using its proprietary electron beam lithography technology, for products such as waveguides and other optical elements.
a leading supplier of Electron Beam Lithography systems, has received an order for one of its EBPG5200 systems from the University of California, San Diego.

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