photomask

(redirected from IC mask)
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photomask

[′fōd·ō‚mask]
(electronics)
A film or glass negative that has many high-resolution images, used in the production of semiconductor devices and integrated circuits.

photomask

An opaque image on a translucent plate that is used as a light filter to transfer an image from one device to another. See chip.
References in periodicals archive ?
today announced an agreement to collaborate on integrated hardware and software solutions for advanced IC mask writing.
Jasdaq:6256) today announced the extension of their successful collaboration on integrated hardware and software solutions for advanced IC mask generation.
Present on the GSA & IET analogue panel were Ross Addinall, Europe technical director at Ciranova, Peter Frith, chief technical officer of Wolfson Microelectronics, Doug Pattullo, director of Field Technical Support at TSMC Europe and Ciaran Whyte, co-founder and chief technical officer at IC Mask Design.
The new HiPer DevGen tool, developed in collaboration with IC Mask Design, is offered as an add-on option that focuses on silicon quality and yield to generate production-ready devices.
Our goal was to create a robust tool that could produce a layout of high quality while simultaneously reducing the cycle time," said IC Mask Founder & CTO Ciaran Whyte.
Tanner EDA Layout Expertise and IC Mask Design's Layout Technology to Boost Design Productivity and Quality
Tanner EDA, the catalyst for innovation for the design, layout and verification of analog and mixed-signal integrated circuits (ICs) and IC Mask Design, an industry leader in the provision of physical design services to the global semiconductor industry, are collaborating on the development of a toolset to accelerate analog layout design.
Tanner EDA and IC Mask Design have been working together since 2007.
Traditionally, custom clocks have not been available for the broad market due to the need to generate custom IC mask sets.
AISS provides software (including SiCat-Core, OPTISSIMO, and PROXECCO) to model and compensate for the physical effects involved in IC mask making and lithography.
census, clinical trials, signal processing, geochemistry, IC mask quality control, water treatment and oil exploration.