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OPC

   Also found in: Acronyms, Wikipedia 0.04 sec.

(1) (OpenGL Performance Characterization) A project group within GPC that manages OpenGL benchmarks. OPC endorses the Viewperf and GLperf benchmarks. Viewperf was created by IBM and OPC provides viewsets for it, which are combinations of tests using specific applications to test OpenGL performance. PTC's CDRS (CDRS-03) is used for modeling and rendering. IBM's Data Explorer (DX-03) is used for visualization. Intergraph's DesignReview (DRV-04) is used for 3D models. Alias/Wavefront's Advanced Visualizer (AWadvs-01) is used for animation, and Lightscape Technology's Lightscape Visualization System (Light-01) is used for radiosity visualization.

Developed by the OPC, the GLperf benchmark measures low-level OpenGL 2D and 3D graphics primitives. The results are the raw performance of a system rather than the application performance as provided by the Viewperf benchmarks. Viewperf results are in frames per second, and GLperf results are in primitives per second. See GPC.

(2) (OLE for Process Control) A set of connectivity standards for industrial automation from the OPC Foundation, Scottsdale, AZ (www.opcfoundation.org). OPC added extensions to Microsoft's COM and DCOM object technology in order to provide a set of common interfaces for process control. OPC offers interoperability between gauges, databases, programmable logic controllers (PLCs), distributed control systems (DCSs) and remote terminal units (RTUs). See OLE, PLC, DLC and RTU.


OPC - OLE for Process Control

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Results support previous research on client satisfaction with OPC and extend the knowledge by providing insight into 6 new categories of services individual clients would find helpful.
In addition to providing a real-time IPC mechanism, DCX ships with a built in Object Linking and Embedding (OLE) for Process Control (OPC) server that allows seamless interoperability with software packages that conform to the OPC Data Access Custom Interface Specification 2.
Our customers find that it is virtually impossible to develop a lithography recipe for 32nm designs without an accurate understanding of the impact of OPC (optical proximity correction) on the design," noted Edward Charrier, vice president and general manager of KLA-Tencor's Process Analysis Division.
 
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