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optical lithography

   Also found in: Wikipedia 0.49 sec.
optical lithography [′äp·tə·kəl li′thäg·rə·fē]
(electronics)
Lithography in which an integrated circuit pattern is first created on a glass plate or mask and is then transferred to the resist by one of a number of optical techniques by using visible or ultraviolet light.


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Nalamasu is recognized as one of the world's leading experts in the areas of optical lithography and polymeric materials science and technology.
In the past, all individual samples of RM 8090 or SRM 2090 were made by direct write electron-beam lithography, because optical lithography did not have the required resolution.
For many decades now, optical lithography has remained an industrial workhorse due in large part to the many enhancement techniques that have prolonged its lifetime, despite repeated forecasts predicting its end.
 
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