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optical mask

   Also found in: Wikipedia 0.01 sec.
optical mask [′äp·tə·kəl ′mask]
(electronics)
A thin sheet of metal or other substance containing an open pattern, used to suitably expose to light a photoresistive substance overlaid on a semiconductor or other surface to form an integrated circuit.


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General topics cover the design, processes and equipment created for production in such topics as mask writing (including e-beam and laser mask writers), conventional and advanced optical masks, NGL masks such as electron beam projection and ion projection lithography, mask processing, materials and pellicles, including descriptions of mask substrates, resists, and optical properties, and mask metrology, inspection, evaluation, and repairs (yes, they can be done).
It uses a special method of optical mask analysis that was developed in cooperation with IBM during the early '90s.
The startup company is focused on the emerging commercial market for software tools that correct for semiconductor lithography errors prior to the production of the optical masks used in deep submicron IC manufacturing.
 
 
 
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