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physical vapor deposition
(redirected from Physical Vapour Deposition)

   Also found in: Wikipedia 0.01 sec.
physical vapor deposition [‚fiz·i·kəl ′vā·pər ‚dep·ə‚zish·ən]
(materials)
A thin-film deposition process in which a material (metal, alloy, compound, cermet, or composite) is either evaporated or sputtered onto a substrate in a vacuum. Abbreviated PVD.


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Physical Vapour Deposition is an environmentally-friendly surface treatment that results in a hard-wearing, long-lasting coating that is up to five times more resistant than more conventional surface treatments.
The Bestpet external coating technology for PET bottles is based on a physical vapour deposition process using silicon oxide in a high vacuum under plasma conditions.
It holds a significant advantage over other techniques, such as physical vapour deposition (PVD) and chemical vapour deposition (CVD).
 
 
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