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physical vapor deposition
(redirected from Physical Vapour Deposition)

   Also found in: Wikipedia 0.05 sec.
physical vapor deposition [‚fiz·i·kəl ′vā·pər ‚dep·ə‚zish·ən]
(materials)
A thin-film deposition process in which a material (metal, alloy, compound, cermet, or composite) is either evaporated or sputtered onto a substrate in a vacuum. Abbreviated PVD.


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It holds a significant advantage over other techniques, such as physical vapour deposition (PVD) and chemical vapour deposition (CVD).
CDT and Tokki will develop the next generation of Tokki's volume manufacturing physical vapour deposition (PVD) and encapsulation technology for CDT's
the commercialized products fall into two (2) major product groups: (1) thin film Physical Vapour Deposition (
 
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