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plasma etching
(redirected from Plasma etch)

   Also found in: Wikipedia 0.04 sec.
plasma etching [′plaz·mə ′ech·iŋ]
(electronics)
A method of forming integrated-circuit patterns on a surface, in which charged species in a plasma formed above a masked surface are directed to impact the nonmasked regions of the surface and knock out substrate atoms. Also known as dry plasma etching.


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CARSON CITY, NV -- Plasma Etch USA reported that counterfeit plasma machines are still being marketed and sold under the name Plasma Etch Inc.
Tegal Corporation (NASDAQ:TGAL), a leading designer and manufacturer of plasma etch and deposition systems used in the production of magnetic data storage, integrated circuits, MEMS, and nanotechnology devices, today announced that it has received additional orders for 981ACS units from a leading hard disk drive manufacturer to support capacity expansion for magnetic data storage device fabrication.
PLASMA equipment maker Plasma Etch recently discovered that counterfeit plasma machines bearing its name were being marketed and sold in China, Taiwan, Malaysia and elsewhere in the Pacific Rim.
 
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