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plasma etching
(redirected from Plasma etch)

   Also found in: Wikipedia 0.01 sec.
plasma etching [′plaz·mə ′ech·iŋ]
(electronics)
A method of forming integrated-circuit patterns on a surface, in which charged species in a plasma formed above a masked surface are directed to impact the nonmasked regions of the surface and knock out substrate atoms. Also known as dry plasma etching.


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PLASMA equipment maker Plasma Etch recently discovered that counterfeit plasma machines bearing its name were being marketed and sold in China, Taiwan, Malaysia and elsewhere in the Pacific Rim.
has sold one of its 901e plasma etch systems to a maker of wireless communications components and systems.
Under the contract, Etched in Time (EITI) will develop a linear plasma etch module using high density downstream processing in conjunction with reactive ion etch (RIE) for etching of dielectric films.
 
 
 
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