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plasma etching |
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plasma etching [′plaz·mə ′ech·iŋ]
(electronics) A method of forming integrated-circuit patterns on a surface, in which charged species in a plasma formed above a masked surface are directed to impact the nonmasked regions of the surface and knock out substrate atoms. Also known as dry plasma etching. Want to thank TFD for its existence? Tell a friend about us, add a link to this page, add the site to iGoogle, or visit the webmaster's page for free fun content. |
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