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plasma etching |
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plasma etching [′plaz·mə ′ech·iŋ] (electronics) A method of forming integrated-circuit patterns on a surface, in which charged species in a plasma formed above a masked surface are directed to impact the nonmasked regions of the surface and knock out substrate atoms. Also known as dry plasma etching. How to thank TFD for its existence? Tell a friend about us, add a link to this page, add the site to iGoogle, or visit webmaster's page for free fun content. |
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Ranson, CNRS-University d'Orleans; and "Development and characterization of imprint-resists as masks for plasma etching," C. NIST scientists have recently developed and validated a model for predicting the kinetic energy of ions in plasma etching reactors used by the semiconductor industry. started 12 years ago building large plasma etching systems (up to 18 X 24 in. |
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