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reactive ion etching |
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reactive ion etching [rē′ak·tiv ′ī‚än ‚ech·iŋ] (electronics) A directed chemical etching process used in integrated circuit fabrication in which chemically active ions are accelerated along electric field lines to meet a substrate perpendicular to its surface. How to thank TFD for its existence? Tell a friend about us, add a link to this page, add the site to iGoogle, or visit webmaster's page for free fun content. |
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