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SOI
(redirected from SIMOX)

   Also found in: Acronyms, Wikipedia 0.01 sec.
SOI
(Silicon On Insulator) A chip architecture that increases transistor switching speed by reducing capacitance (build-up of electrical charges in the transistor's elements), and thus reducing the discharge time. The power requirement is also reduced in some designs. The SOI technique creates the transistors on a thin top silicon layer that is separated from the silicon substrate by a thin insulating layer of glass or silicon dioxide. One method of forming this insulating layer is the Separation by Implantation of Oxygen (SIMOX) technique, which implants oxygen into the wafer under intense heat.


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Reid added, "I will continue in my role at Ibis and expand my day-to-day efforts at the Company as we remain focused on our SOI technology and SIMOX development.
president and CEO of Ibis Technology Corporation, said, "At this point in time we have no indication from our customers on the timing of their next implanter orders, or visibility regarding their SIMOX implanter requirements during 2008.
Our largest customer, who has two Ibis i2000 implanters in operation, is currently focused on qualification runs for its customers and joint technology development activities with Ibis to advance the SIMOX technology and economics.
 
 
 
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