Tournadre, 1998: Observation of tropical cyclones by high-resolution scatterometry
The author has organized the main body of his text in five chapters devoted to an introduction to wave scattering, surface backscattering mechanisms, surface backscattering trends and comparisons with measurements, backscattering from the sea surface, and a geophysical model function for wind scatterometry
The NIST researchers first created a library of simulated data based on typical semiconductor chip feature dimensions to which they can compare actual measurements with AFM, scatterometry
and other means.
Other SEMATECH papers will showcase advances in metrology techniques, photoresist shrinkage, scatterometry
, non-destructive TSV etch depth, CD-SAXS - a possible x-ray metrology CD technique for future nodes - and an optical CD metrology technique under development at NIST, which was a winner of last year's R&D Magazine's R&D 100 award.
Other sensor applications include mid-infrared rangefinding and Doppler scatterometry
Hybrid metrology is related to the reference CD metrology feedback loop in conventional CD metrology process control that is mostly done by CD-SEM and scatterometry
Unlike competing techniques such as scatterometry
and x-ray, Rudolph's PULSE([TM]) Technology offers the capability for all of the above copper processes in a single tool.
The InSight 3DAFM tool will address this concern and will be used as part of our overall CD metrology strategy to provide reference metrology for CD-SEMs and scatterometry
Ahmad Khan, vice president and general manager of KLA-Tencor's Films and Scatterometry
Technology (FaST) Division added, "We are delighted that our year-long project with Timbre and TEL has allowed us to extend the capability of our successful SpectraCD product line.
When combined with the NanoCD Suite, Nanometrics systems have the broadest scatterometry
metrology solution for today's semiconductor factories.
Customers also have the option of adding KLA-Tencor's advanced scatterometry
measurement technology to the Archer 200 to provide increased flexibility in meeting their specific 32nm and beyond dimensional metrology requirements.
The NovaScan 3090Next is an advanced metrology platform for Optical CD Control and shape-profiling, implementing polarized normal incidence spectroscopic scatterometry
with an extended Deep UV (DUV) and IR spectral range.