electron-beam ion source
electron-beam ion source
[i′lek‚trän ‚bēm ′ī‚än ‚sȯrs] (electronics)
A source of multiply charged heavy ions which uses an intense electron beam with energies of 5 to 10 kiloelectronvolts to successively ionize injected gas. Abbreviated EBIS.
McGraw-Hill Dictionary of Scientific & Technical Terms, 6E, Copyright © 2003 by The McGraw-Hill Companies, Inc.
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