cesium-beam sputter source

cesium-beam sputter source

[′sē·zē·əm ‚bēm ′spəd·ər ‚sȯrs]
(electronics)
A source of negative ions in which a beam of positive cesium ions, accelerated through a potential difference on 20-30 kilovolts, sputters the cesium-coated inner surface of a hollow cone fabricated from or containing the element whose negative ion is required, and an appreciable fraction of the negative ions leaving the surface are extracted from the rear hole of the sputter cone.