chemical vapor deposition


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chemical vapor deposition

[′kem·i·kəl ¦vā·pər ‚dep·ə′zish·ən]
(solid-state physics)
The growth of thin solid films on a crystalline substrate as the result of thermochemical vapor-phase reactions. Abbreviated CVD.
References in periodicals archive ?
Table 18: World Recent Past, Current & Future Analysis for Thin Layer Deposition Equipment by Technology - Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD) Markets Independently Analyzed with Annual Sales Figures in US$ Million for Years 2001 through 2010 (includes corresponding Graph/Chart) II-66
INDUSTRY OVERVIEW II-1 A Prelude II-1 Characteristics of the CVD Vs the PVD Market II-1 Impact of the 2007-2009 Recession in Retrospect II-2 Table 1: High-Performance Ceramic Coating Technologies Market in North America (2012): Percentage Market share Breakdown by Technology (includes corresponding Graph/Chart) II-3 Established Majors Rule Thin Film Deposition Market II-3 Table 2: World Deposition Equipment Market (2012) - Percentage Market Share Breakdown of Leading Players (includes corresponding Graph/Chart) II-4 Table 3: World Chemical Vapor Deposition (CVD) Equipment Market (2012) - Percentage Share Breakdown of Revenue by Leading Players (includes corresponding Graph/Chart) II-4
BCC Research's goal in conducting this study was to determine the current status of the global market for thin-layer deposition by looking at three important technologies: chemical vapor deposition (CVD), ion implantation and molecular beam epitaxy (MBE).
Table 3: Leading Players in World Chemical Vapor Deposition
Secondly, the sale includes a development program to add Plasma Enhanced Chemical Vapor Deposition (PECVD) capability to the Clusterlock(R) 7000 platform.
1) PECVD = plasma enhanced chemical vapor deposition
2 million effort to develop an efficient, high-volume technology for producing diamond films using the Westinghouse plasma torch with the chemical vapor deposition process.
4 /PRNewsire/ -- Advanced Technology Materials, a leading developer of high-performance semiconductors and thin film processing technologies, today announced two contracts with the Strategic Defense Initiative Office (SDIO) for development of barium titanate (BaTiO3) thin films using chemical vapor deposition (CVD) technology.
Chemical vapor deposition processes, with their inherent superior step coverage, will replace sputtering in advanced advice applications.
The same software platform has been used in chemical vapor deposition (CVD), physical vapor deposition (PVD) and etch systems in production environments by fabs around the world.
With exclusively licensed commercial rights to nanotube technology developed at some of the world's most respected research universities, the NanoPolaris IP portfolio includes patents and patent applications claiming nanotube compositions of matter and general manufacturing techniques such as chemical vapor deposition synthesis, plasma chemical vapor deposition synthesis, purification, solubilization, separation of certain types of tubes, coatings, functionalization, and manipulation.

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