dielectric film


Also found in: Acronyms.

dielectric film

[‚dī·ə′lek·trik ′film]
(electricity)
A film possessing dielectric properties; used as the central layer of a capacitor.
References in periodicals archive ?
By arming our engineers with CyberOptics' innovative Automatic Gapping System, we have been able to deliver industry-leading dielectric film uniformity on VECTOR and at the same time significantly reduce maintenance costs and system downtime.
To address the requirement of lower temperature dielectrics, Novellus' VECTOR platform with its patented multi-station sequential deposition architecture (MSSD) enables the deposition of stable dielectric films at temperatures less than 200 degrees C with the breakdown voltage, leakage performance, and wafer-to-wafer repeatability required for reliable, high yielding TSVs.
Today the fastest and most advanced devices in the industry use Novellus dielectric films.
the productivity and technology leader in advanced deposition, surface preparation and chemical mechanical planarization processes for the global semiconductor industry, today introduced SOLA(TM), the industry's first standalone ultraviolet thermal processing (UVTP) system targeted at the post-deposition processing of advanced dielectric films.
The semiconductor/electronics web page gives very short descriptions of what NIST does to help build better microchips, from more accurately measuring step heights, dielectric films and interconnects to ways to improve manufacturing processes.
Motorola Inc recently claimed another breakthrough, integrating copper with porous low-k dielectric films using multilevel fabrication of interconnects, which it says further reduce capacitance in integrated circuits, and results in "an explosive speed improvement.
The study also includes a detailed analysis of the global market for AC and DC film capacitors by customer base, end-use market segment, channel of distribution; circuit application and world region; and also includes a review of the supply chain for plastic dielectric materials consumed as capacitor dielectric materials, including polypropylene (OPP), polyethylene terephthalate (PET), polyphenylene sulfide (PPS) and polyethylene naphthalate (PEN), and other exotic dielectric films (Teflon, Kapton).
Procured an apparatus for the deposition of thin films in a vacuum, allowing the deposition of metallic and dielectric films by thermal evaporation.
Four papers cover valve metal, silicon and ceramic oxides as dielectric films for passive and active electronic devices; superconformal film growth; transition metal macrocyles as electro-catalysts for dioxygen reduction; and multiscale modeling and design of electrochemical systems.
Working at the NIST Center for Neutron Research, the team is using small-angle neutron scattering to characterize a growing cast of nanoporous, low-k dielectric films.
NIST scientists are championing a comprehensive study to compare quantum mechanical simulators and software suites designed to predict the properties of ultrathin silicon dioxide and alternate gate dielectric films.