disilane


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disilane

[dī′si‚lān]
(inorganic chemistry)
Si2H6 A spontaneously flammable compound of silicon and hydrogen; it exists as a liquid at room temperature.
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Its chemical products include, boron trifluoride, diborane, disilane, germane, silane, silicon tetrafluoride, and trimethylboron are used to deposit or modify semiconducting, conducting and dielectric layers.
The firm specializes in extremely high purity gases such as boron trifluoride, diborane, disilane, germane, silicon tetrafluoride and trimethylboron used for semiconductor manufacturing.
Among 16 new semiconductor process gases added to Praxair's worldwide product portfolio are: germane, silicon tetrafluoride, germanium tetrafluoride, trimethylboron, deuterium, disilane, methylsilane, halocarbon 32, halocarbon 218, halocarbon C318, sulfur dioxide, chlorine trifluoride, halocarbon 125, nitric oxide and halocarbon 41.
Voltaix products are available worldwide both directly and through most of the major international electronic gas companies and include: germane and digermane; diborane, boron trifluoride and trimethylboron; silane, disilane and trisilane; silicon tetrafluoride and germanium tetrafluoride; and a wide variety of isotopically enriched electronic specialty gases.
Its products include, germane, diborane, silane, disilane, silicon tetrafluoride, boron trifluoride and trimethylboron.
Brus and Bell Labs colleague Karl Littau made silicon crystals with diameters ranging from less than 2 nanometers to about 8 nanometers by heating a gaseous silicon-hydrogen compound called disilane to 850 [degrees] C.
Disilane is a critical material for low temperature polysilicon deposition in memory and logic device structures.
Holger Kirchner, Head of Electronic Materials, of Linde said, "The increasing demand for low temperature precursors, specifically disilane in electronics fabrication was a key driver in working with Voltaix.
It is used in the production of advanced memory and microprocessor chips, and disilane consumption is projected to grow sharply as device sizes shrink below 20nm.
The two companies are also discussing plans to install disilane supporting infrastructure at a Voltaix site in Asia.