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dry plasma etching |
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dry plasma etchingA method for inscribing a pattern on a wafer by shooting hot ions through a mask to evaporate the silicon dioxide insulation layer. Dry plasma etching replaces the wet processing method that uses film and acid for developing the pattern. dry plasma etching [¦drī ′plaz·mə] (electronics) How to thank TFD for its existence? Tell a friend about us, add a link to this page, add the site to iGoogle, or visit webmaster's page for free fun content. |
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An innovator of advanced wafer-thinning processes and applications, Tru-Si will utilize its processing knowledge and proprietary equipment for dry plasma etching to produce silicon wafers that are thinned to 100 microns or less. |
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