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electron beam lithography

   Also found in: Acronyms, Wikipedia 0.04 sec.

Using electron beams to create the mask patterns directly on a chip. The wavelength of an electron beam is only a few picometers compared to the 248 to 365 nanometer wavelengths of light used to create the traditional photomasks.

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The tiny lines on this silicon wafer were created using Lucent's SCALPEL electron beam lithography. The right-leaning lines are .08 microns wide. It would take 1,250 of them to equal the width of one human hair. (Image courtesy of Lucent Technologies.)
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The apparatus is easily handled by anyone, and enables nanometer-scale fabrication at low cost, which until now could only be done with expensive large apparatus using short wavelength light, such as vacuum ultraviolet light (for the photolithography method) and electron beams (for the electron beam lithography method).
National Institute of Advanced Industrial Science and Technology ... by JCNN News Summaries
com), a developer of electron beam lithography systems for the worldwide semiconductor industry, has selected Grant Technologies (www.
Vistec Selects Grant Bespoke Refrigeration Solution For E-Beam ... by Business Wire
OB - News), the premier provider of services, support and financing to drive the commercialization of nanotechnology discoveries, today announced that it has invested in the procurement of an electron beam lithography (EBL) tool for use on the development of Advance Nanotech technologies at the University of Cambridge (United Kingdom).
Advance Nanotech Invests in Research Equipment for University of ... by Business Wire
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