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electron-beam lithography

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electron-beam lithography [i′lek‚trän ‚bēm li′thäg·rə·fē]
(electronics)
Lithography in which the radiation-sensitive film or resist is placed in the vacuum chamber of a scanning-beam electron microscope and exposed by an electron beam under digital computer control; after exposure, the film is removed from the vacuum chamber for conventional development and other production processes.


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In the past, all individual samples of RM 8090 or SRM 2090 were made by direct write electron-beam lithography, because optical lithography did not have the required resolution.
The following technologies are covered in this research: - Optical lithography - Maskless lithography - Electron-beam lithography - X-ray lithography - Nanoimprint lithography The Semiconductor Industry is facing the limits of Photolithography and the Emergence of Next Generation Technologies In the last two decades, novel lithographic technologies have been introduced and evaluated for its capacity to meet challenging technological requirements, production throughput and cost-effectiveness.
 
 
 
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