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electron-beam lithography |
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electron-beam lithography [i′lek‚trän ‚bēm li′thäg·rə·fē] (electronics) Lithography in which the radiation-sensitive film or resist is placed in the vacuum chamber of a scanning-beam electron microscope and exposed by an electron beam under digital computer control; after exposure, the film is removed from the vacuum chamber for conventional development and other production processes. How to thank TFD for its existence? Tell a friend about us, add a link to this page, add the site to iGoogle, or visit webmaster's page for free fun content. |
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