high etch

high etch

[′hī ¦ech]
(graphic arts)
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High concentrations can lead to high etch depth and undesired galvanic corrosion.
In addition to process flexibility, we also require high etch rates with good uniformity and profile control for typical MEMS structures, and very fine CD control and smooth sidewalls for semiconductor and TSV applications.
In this regime the flow of reactive neutrals dominates over diffusion with the resulting high etch rates.
In addition to demonstrating sustained high etch rates, the new ProNova2[TM] reactor offers a three-fold improvement in ion uniformity over standard ICP sources.
The ability to etch sufficient amounts to provide a good solderable surface no longer needs to be compromised by localized high etch rates.
This dry, gas phase etch provides high selectivity, high etch rates and long undercuts while providing high selectivity over the majority of semiconductor materials.
In addition to demonstrating sustained high etch rates, the new reactor offers a three-fold improvement in ion uniformity.
In addition to the material's exceptionally high purity, PlasmaPure-UC alumina offers high etch resistance in corrosive chemistries, very low sodium content, and an extremely low dielectric loss tangent of <0.
Together with its high reliability, broad process windows, and high etch rates, the Tegal 110 S/DE system is a critical enabler for etching silicon (S) and dielectric (DE) films found in the MEMS/MOEMS, bio-tech, and hi-voltage markets.
Due to its high etch selectivity and film transparency, Novellus' AHM on the VECTOR Express platform is already the film of choice at a number of leading-edge memory device manufacturers.
Together with its high reliability, broad process windows, and high etch rates, the Tegal 200 SE system is a critical enabler for etching silicon (SE) films found in the MEMS, bio-tech, power IC, optoelectronic, and 3D-IC markets.
This is the first Pegasus we have sold to a US university and only the fifth research institute worldwide to install this capability, with the vast majority of Pegasus systems going into volume production applications where the high etch rate and cross wafer uniformity offered by this tool are of paramount importance.

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