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metal-organic chemical vapor deposition |
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metal-organic chemical vapor deposition [′med·əl ȯr′gan·ik ′kem·ə·kəl ′vā·pər ‚dep·ə′zish·ən]
(solid-state physics) A technique for growing thin layers of compound semiconductors in which metal organic compounds, having the formula MRx, where M is a group III metal and R is an organic radical, are decomposed near the surface of a heated substrate wafer, in the presence of a hydride of a group V element. Abbreviated MOCVD. Want to thank TFD for its existence? Tell a friend about us, add a link to this page, add the site to iGoogle, or visit the webmaster's page for free fun content. |
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