metal-organic chemical vapor deposition


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metal-organic chemical vapor deposition

[′med·əl ȯr′gan·ik ′kem·ə·kəl ′vā·pər ‚dep·ə′zish·ən]
(solid-state physics)
A technique for growing thin layers of compound semiconductors in which metal organic compounds, having the formula MRx , where M is a group III metal and R is an organic radical, are decomposed near the surface of a heated substrate wafer, in the presence of a hydride of a group V element. Abbreviated MOCVD.
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Nasdaq:CVCI), a worldwide supplier of cluster tool equipment for the fabrication of thin film recording heads, semiconductor devices and optical components for the telecommunications market, announced that it has shipped its CONNEXION(R) Metal-Organic Chemical Vapor Deposition (MOCVD) Cluster Tool to a disk drive recording head manufacturer.
CVC provides cluster tool manufacturing equipment for Physical Vapor Deposition (PVD) by plasma sputtering or via Ion Beam Deposition (IBD), Ion Beam Etch (IBE), Diamond-like Carbon (DLC) and Metal-Organic Chemical Vapor Deposition (MOCVD).
CVC offers advanced thin film process solutions with focus in key thrust areas: Physical Vapor Deposition (PVD) by plasma sputtering or via Ion Beam Deposition (IBD), Ion Beam Etch (IBE), Diamond-like Carbon (DLC) and Metal-Organic Chemical Vapor Deposition (MOCVD).
CVC provides cluster tool manufacturing equipment for the data storage and semiconductor industries, including Physical Vapor Deposition (PVD) and Metal-Organic Chemical Vapor Deposition (MOCVD).
CVC provides cluster tool manufacturing equipment for the data storage and semiconductor industries, including Physical Vapor Deposition (PVD), Metal-Organic Chemical Vapor Deposition (MOCVD) and Rapid Thermal Chemical Vapor Deposition (RTCVD).

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