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physical vapor deposition

   Also found in: Acronyms, Wikipedia 0.03 sec.
physical vapor deposition [‚fiz·i·kəl ′vā·pər ‚dep·ə‚zish·ən]
(materials)
A thin-film deposition process in which a material (metal, alloy, compound, cermet, or composite) is either evaporated or sputtered onto a substrate in a vacuum. Abbreviated PVD.


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The same software platform has been used in chemical vapor deposition (CVD), physical vapor deposition (PVD) and etch systems in production environments by fabs around the world.
The same software platform has been used in chemical vapor deposition (CVD), physical vapor deposition (PVD) and etch systems in production environments by fabs around the world.
Aviza is pleased to be able to continue to support Freescale's manufacturing needs and complement the existing physical vapor deposition (PVD) and etch systems at Toulouse," said Kevin T.
 
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