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x-ray lithography

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x-ray lithography [′eks ‚rā li′thäg·rə·fē]
(electronics)
Lithography in which the resist is exposed to a well-collimated, high-intensity x-ray beam projected through a special mask in close proximity to the silicon slice.


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The following technologies are covered in this research: - Optical lithography - Maskless lithography - Electron-beam lithography - X-ray lithography - Nanoimprint lithography The Semiconductor Industry is facing the limits of Photolithography and the Emergence of Next Generation Technologies In the last two decades, novel lithographic technologies have been introduced and evaluated for its capacity to meet challenging technological requirements, production throughput and cost-effectiveness.
Under this contract, JMAR will use its patented, advanced X-ray lithography stepper technology and newly developed X-ray masks to demonstrate fabrication of high-density CRAM integrated circuits with 35-50nm contact holes enabling 4 Mb and higher densities for high-priority military and space applications.
Nasdaq: JMAR) has been issued a patent (US 6,845,145 B2) for advanced X-ray lithography stepper technology that will enable a faster, more cost-effective means of producing state-of-the-art zone plate optics for its Compact X-ray Microscope and X-ray Nano Probe product lines.
 
 
 
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