chemical vapor deposition

(redirected from Atmospheric Pressure CVD)

chemical vapor deposition

[′kem·i·kəl ¦vā·pər ‚dep·ə′zish·ən]
(solid-state physics)
The growth of thin solid films on a crystalline substrate as the result of thermochemical vapor-phase reactions. Abbreviated CVD.
References in periodicals archive ?
Thereafter, atmospheric pressure CVD (AP-CVD) or other carbon feedstocks have been explored (other gaseous hydrocarbons or carbon containing liquid or solid precursors) [15, 16].
Caussat, "High quality graphene synthesized by atmospheric pressure CVD on copper foil," Surface and Coatings Technology, vol.
OKI Engineering, provider of reliability evaluations and environmental conservation technologies for the OKI Group, recently delivered an additional unit of KGT-3MM-AP exhaust gas treatment equipment for atmospheric pressure CVD manufacturing equipment to semiconductor manufacturer ON Semiconductor's European plants.
In the manufacture of power devices such as Power FET and IGBT atmospheric pressure CVD manufacturing equipment is vital at the stage of insulating film manufacture.
OKI Engineering 's KGT-3MM-AP exhaust gas treatment contains a special stainless steel filter, which minimizes filter clogging and helps remove the harmful gases and particulate matter used with atmospheric pressure CVD manufacturing equipment.
OKI Engineering has added a newly developed function as an option, which resets abnormalities in the atmospheric pressure CVD equipment by detecting pressure abnormality occurred during maintenance, in turn, enhancing customer satisfaction.

Full browser ?