EUV


Also found in: Dictionary, Acronyms.

EUV

(extreme ultraviolet) Another name for XUV. See XUV astronomy.
References in periodicals archive ?
Compared to its 10nm FinFET predecessors, Samsungs 7LPP EUV technology not only greatly reduces the process complexity with less process steps and better yield, but also allows up to a 40% increase in area efficiency with 10% higher performance or up to 35% lower power consumption.
We are pleased to continueto expandourfoundry relationshipwith QualcommTechnologiesin 5G technologies using our EUV process technology," said Charlie Bae, executive vice president of Foundry Sales and Marketing Team at Samsung Electronics.
The EUV project consists of 80 Pakistani teams that will conduct verification checks countrywide.
Where V represents the vertically integrated ionospheric free electron density (known as Vertical Total Electron Content, Vertical TEC or VTEC), [eta]' stands for the ionization efficiency, C([chi]) represents the cross section for a solar-zenithal angle [chi], referred to the value C(0) at the sub-solar point, and [partial derivative]I(t)/[partial derivative]t is the sudden solar flux increase at the EUV geoeffective band, at time t.
ASML said that it intends to manage Cymer's commercial operations as an independent division based in the US and will continue to deliver and service DUV and EUV sources for all customers on an arm's length basis.
Intel hasn't said when it will move to 450-mm wafers and EUV, but it has already invested billions to help it manufacture smaller, faster chips.
Solar EUV irradiance during the recent prolonged solar minimum was somewhat lower on average than during the prior minimum.
XTREME Technologies has an existing research and development activity for EUV light sources, and has been a partner with Philips since 2008 in the development of next-generation semiconductor-based EUV light sources.
Later chapters cover EUV optics, EUV wavefront measurement techniques, contamination in EUVL scanners, mask technology, resist technology, design considerations, MET optics, and lithography cost trends.
The researchers combined a high-power laser with their specialized laser plasma source technology to convert the laser light to EUV and effectively eliminate the neutral and charged particles that are associated with existing EUV plasma sources.
The partners will provide timely mask capabilities in support of EUV lithography insertion.
StressPly[R] EUV Mineral with Starburst[TM] Mineral Surfacing, an energy-saving modified bitumen roofing system, combines the superior tensile (700 lbs.