electron beam lithography

(redirected from Electron lithography)

electron beam lithography

Using electron beams to create the mask patterns directly on a chip. The wavelength of an electron beam is only a few picometers compared to the 248 to 365 nanometer wavelengths of light used to create the traditional photomasks.


Magnified 35,000 Times
The tiny lines on this silicon wafer were created using Lucent's SCALPEL electron beam lithography. The right-leaning lines are .08 microns wide. It would take 1,250 of them to equal the width of one human hair. (Image courtesy of Lucent Technologies.)
References in periodicals archive ?
Projection electron lithography has already shown significant potential to be the technology of choice to create the circuits that will be needed for advanced DRAMs (dynamic random access memory) as we move to 0.
SCALPEL projection electron lithography is being developed as a potential successor to current optical lithography methods for patterning smaller, more powerful chips.
Contract award: delivery and commissioning equipment for high resolution electron lithography and nanoengineering for the faculty of physics.
Apparatus for high resolution electron lithography and Nanoengineering.
Contract notice: Equipment design studio intercollegiate center nanobiomedyczne delivery and installation of electron lithography for scanning electron microscope jeol jsm-7001f ttls with the launch and training of employees

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