Contract notice: Provision Of A Spectroscopic Ellipsometer
A spectroscopic ellipsometer
is a high-precision and non-contacts measurement instrument that uses changes in the polarization of light to measure the thickness and optical coefficients (refractive index and extinction coefficient) of a transparent or semi-transparent thin film.
The surface of the silicon wafer was further investigated by the spectroscopic ellipsometer
is also shown in Table I.
ULVAC also releases, the "UNECS-3000A", an automatic high-speed spectroscopic ellipsometer
which can measure the thickness of a thin film, as well as, optical constant.
Ellipsometric analyses were done by using a Gaertner ellipsometer
L116S, equipped with an HeNe laser ([lambda]=632.
nano size) might be used with an ellipsometer
to determine of the RI of these particles.
Standards were measured using the contact profilmeters, atomic force microscope, interference microscope, ellipsometer
and scanning tunneling microscope (STM).
The thicknesses of the coatings were obtained using a VASE spectroscopic ellipsometer
(SE, J A Woollam Inc.
thickness of PVP and Ag/PVP thin layers formed on Si plate were measured, and only approximate results obtained: thickness range of both layers were 0.
Reproducibility in the coating thickness on the glass plates or on witness plates was achieved by monitoring with a 3-wavelength (HeNe) ellipsometer
(AutoEL[R]-III Automatic Ellipsometer
; Rudolph Research) and was critically dependent on having a contamination-free glass surface.
The thickness of the photoresist layers and the adsorption of the surfactant were measured in situ using a null ellipsometer
in a polarizer-compensator-sample-analyzer arrangement (Multiskop, Optrel Berlin) with a He-Ne laser light source of 632.
All measurements were performed with a Rudolph 436 thin film ellipsometer
at 401 nm.