Tanner EDA, the catalyst for innovation for the design, layout and verification of analog and mixed-signal integrated circuits (ICs) and IC Mask Design, an industry leader in the provision of physical design services to the global semiconductor industry, are collaborating on the development of a toolset to accelerate analog layout design.
Tanner EDA and IC Mask Design have been working together since 2007.
Commenting on the collaboration, Greg Lebsack, president of Tanner EDA, said, "We are very focused on bringing innovations from trusted, well-regarded partners to our customers, and are pleased to be able to help them benefit from the depth and breadth of IC Mask Design's experience in analog layout design.
Ciaran Whyte, co-founder and CTO of IC Mask Design, added, "We have always been impressed with the functionality and ease-of-use that Tanner EDA's tools deliver to designers.
Previews of the joint solution developed by Tanner EDA and IC Mask Design will be available from March 9th to March 12th in Booth #12 at the Design Automation & Test in Europe (DATE) conference in Dresden, Germany.