chemical vapor deposition(redirected from Microwave Plasma-assisted CVD)
chemical vapor deposition[′kem·i·kəl ¦vā·pər ‚dep·ə′zish·ən]
The growth of thin solid films on a crystalline substrate as the result of thermochemical vapor-phase reactions. Abbreviated CVD.
McGraw-Hill Dictionary of Scientific & Technical Terms, 6E, Copyright © 2003 by The McGraw-Hill Companies, Inc.