optical lithography


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Related to optical lithography: Electron beam lithography

optical lithography

[′äp·tə·kəl li′thäg·rə·fē]
(electronics)
Lithography in which an integrated circuit pattern is first created on a glass plate or mask and is then transferred to the resist by one of a number of optical techniques by using visible or ultraviolet light.
References in periodicals archive ?
Lipson, Mitchell, and Lu have developed novel optical lithography techniques that are expected to ultimately be used for fabricating PCs.
The air gap is a source of limitation for traditional optical lithography because of the refractive index of the air.
Formed in 1977, San Jose, California-based SVG began in the photoresist processing equipment market, but later expanded by buying Anicon Inc in 1987 for chemical vapor deposition, Perkin-Elmer Inc's optical lithography unit in 1990, and Tinsley Laboratories in November 1997 for deep ultraviolet lithography.
This technique, called optical lithography, has constantly been improved, extending down to dimensions thought impossible by process technologists just a few years ago.
One advantage of EUV lithography is that the overall setup resembles that required for conventional optical lithography. The main difference is that, in order to reduce absorption, an elaborate set of mirrors replaces the refractive lenses to focus the radiation.
HBTs have the advantage of providing a high-speed transistor with easily-implemented optical lithography.
Tenders are invited for Procurement of optical lithography system with mask aligner and accessories
This fine resolution of patterning is made possible by Rolith's proprietary manufacturing technology known as Rolling Mask Lithography (RML(TM)), which is based on near-field continuous optical lithography and implemented using cylindrical phase masks.
While optical lithography is mainly intended for patterns of a few micrometers to a few 100 microns, the electron beam lithography allows for its part to achieve submicron resolutions far.
For students, new and experienced engineers, technology managers, and senior technicians who want to learn more about the image formation physics of a lithographic system, Lin (optical lithography, National Taiwan U.), who works in microlithography and is editor of the Journal of Micro/Nanolithography, MEMS, and MOEMS, explains the basic equations and constants of optical lithography, the basics of exposure systems and image formation, and system components, processing, and optimization.
His research interests include laser spectroscopy, optical lithography for photonics applications, and technique development in mass spectrometry.