chemical vapor deposition

(redirected from Rapid Thermal CVD)

chemical vapor deposition

[′kem·i·kəl ¦vā·pər ‚dep·ə′zish·ən]
(solid-state physics)
The growth of thin solid films on a crystalline substrate as the result of thermochemical vapor-phase reactions. Abbreviated CVD.
References in periodicals archive ?
The first SiGe transistors made at the IBM Corporation were realized using expensive molecular beam epitaxy, but since then a number of interesting new techniques have been developed, such as the ultra-high vacuum chemical vapor deposition (UHV/CVD) |2~ and Rapid Thermal CVD |3~.

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