reactive ion etching


Also found in: Acronyms.

reactive ion etching

[rē′ak·tiv ′ī‚än ‚ech·iŋ]
(electronics)
A directed chemical etching process used in integrated circuit fabrication in which chemically active ions are accelerated along electric field lines to meet a substrate perpendicular to its surface.
Mentioned in ?
References in periodicals archive ?
Cea-leti is looking for reactive ion etching equipment for dielectric materials and gan alloys for the treatment of 200 mm diameter plates.
Second, the mask etching is done by etching silicon dioxide layer through selective reactive ion etching (RIE) to make the etching mask.
Acquisition, delivery and installation of a plasma reactive ion etching machine in capacitive coupling mode (rie-ccp) able to perform machining on both dielectric substrates (siox, sinx) and on semiconductor substrates (si ) or on hard substrates to be etched such as linbo3 or pzt, with excellent flank verticality (close to 90 degrees) and excellent selectivity.
Summary: TEHRAN (FNA)- The researchers at Tose-e-Hesgar-Sazan-Asia Company managed to design and construct 'Deep Reactive Ion Etching Device' which is able to act as an environmentally-sustainable system by using H2 and O2 instead of a sort of polymer utilized in its foreign rivals.
Tenders are invited for Supply of Deep reactive ion etching system
Among such equipment, mention can be made of scanning tunneling microscope (STM), atomic force microscope (AFM), BET, deep reactive ion etching (DRIE), HiReSPECT and capillary electrophoresis instrument.
Needed are small-footprint, dry pumping systems that can deal with source-gas flow rates that are greater than several thousands SCCM for plasma enhanced chemical vapor deposition and reactive ion etching.
Tenders are invited for Compact Reactive Ion Etching (Rie) System
Other process technologies used by less than 20% of the respondents included (in order of preference) electron beam evaporation, reactive ion etching (RIE), ion plating, cathodic arc deposition, molecular beam epitaxy (MBE), web coating, general vacuum pumping, ion implantation, plasma processing, and vacuum forming and sealing.
Invitation to tender : The Swiss Federal Institute of Technology Lausanne (EPFL) intends to purchase for the cleanroom of the Institute of Solid State Physics (IPHYS) to provide a Reactive Ion Etching Inductively Coupled Plasma System (RIE-ICP).

Full browser ?