reactive ion etching

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reactive ion etching

[rē′ak·tiv ′ī‚än ‚ech·iŋ]
(electronics)
A directed chemical etching process used in integrated circuit fabrication in which chemically active ions are accelerated along electric field lines to meet a substrate perpendicular to its surface.
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His final position at HP was project manager and scientist in the ULSI research laboratory, where he established and led a research team focused on deep sub-micron lithography, reactive-ion etching, and metrology.