anneal


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anneal

[ə′nēl]
(engineering)
To treat a metal, alloy, or glass with heat and then cool to remove internal stresses and to make the material less brittle. Also known as temper.
(genetics)
To recombine strands of complementary deoxyribonucleic acid that were separated by heating or other means of denaturation.

anneal

To take the brittleness out of metal, plastic or certain carbon composites. Performed in the preparation of new products or in their restoration, annealing is accomplished via a heat treating process.
References in periodicals archive ?
To prevent thermal degradation during annealing, all PDO specimens were annealed under vacuum.
The films were studied under as-deposited and 200C and 300C annealed conditions.
(See Figure 2d, focusing just on the lower strand from 2c.) This makes the nascent strand ssDNA, allowing the opposing primer (Primer l in Figure 2c) to anneal, and DNA polymerase to again start strand synthesis.
For those handloaders who need to anneal a big bunch of cases, Ken Light Manufacturing offers the BC 1000 Automatic Case Annealer.
After deposition the specimens were subjected to anneals (0.5 h) at 300 K, 330 K, 350 K, 400 K, or 450 K, in gas mixture of Ar (volume fraction 95%) and [H.sub.2] (volume fraction 5%) at [10.sup.5] Pa.
A common variant of these tests consists of a 4 hour anneal at 155[degrees]C, intended to simulate one year of storage at room temperature.
When the furnace batch completes, he pulls it out and swings the turntable to load the next batch, cutting load/unload time to five minutes between anneals. Using the turntable will increase productivity by 30 or 40 percent.
It is observed that the samples annealed at higher temperatures have lower values of current density as compared to their lower valued counterparts, when applied bias is increased steadily from 0 to 2.5 volts.
This amplification efficiency approaches that of PCR, and with similar specificity as defined by the need for two primers to anneal to matching target sequences.
He added: "Slimmer nanorods, by virtue of their smaller diameters, require less heat to anneal. These lower temperatures won't damage or degrade the delicate semiconductors.
After deposition, the films were subsequently annealed in a conventional furnace at temperatures of 400 and 500[degrees]C for 1 h in nitrogen ambient.
After vacuum diffusion bonding, the samples were annealed at 200, 250, and 300[degrees]C.