The unique alloy composition ensures the coating is easy to apply and provides consistent uniform sacrificial corrosion of the anode, minimal self protection, negligible wasted current capacity and high
anode efficiency.
The P+ region in the backside of the wafer enhances
anode efficiency. The combination of this device construction and the trench structure's high channel density produces a high carrier density in the drift region and a low forward voltage drop.
For acid solutions soluble anodes are usual and have no problems; small areas of insoluble anodes are used to reduce the
anode efficiency to ~96% which may traditionally be silicon-iron or nowadays iridium-oxide coated titanium.