atomic layer deposition


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atomic layer deposition

A semiconductor manufacturing technique that deposits a single layer on a chip that is only one atom or one molecule thick. As elements on a chip decreased to below 100 nm, this essential technology for making the chip ever smaller became commercial after the turn of the 21st century. For example, Applied Materials introduced its first atomic layer deposition chamber in 2001.
References in periodicals archive ?
Arradiance now claims exclusive patent right to nanofilm electron resistive and emissive coatings deposited by Atomic Layer Deposition technology for use in MCPs.
In addition, the company offers solutions leveraging its proprietary coherent gradient sensing (CGS) technology to the semiconductor wafer inspection market and provides atomic layer deposition (ALD) tools to leading research organizations, including academic and industrial institutions.
An October 2008 symposium highlighted research in fields where atomic layer deposition (ALD) is used, with a special focus on emerging and non-mainstream ALD applications.
The analysts forecast the Global Atomic Layer Deposition market to grow at a CAGR of 36.
A kind of chemical vapor deposition, atomic layer deposition is a coating technology that involves alternately filling a closed chamber with two different precursors, never allowing both to be there at the same time.
Because atomic layer deposition is commonly used in industry, the new finFET technique may represent a practical solution to the coming limits of conventional silicon transistors.
Elam (Argonne National Laboratory), De Gendt (IMEC) and Kang (Samsung Electronics) have collected these research papers, which were originally presented at the third symposium on Atomic Layer Deposition Applications in 2007.
Arradiance today announced their powerful new GEMStar[TM] Benchtop Atomic Layer Deposition (ALD) system timed with the start of the American Vacuum Society's annual Atomic Layer Deposition Meeting in Seoul, Korea where Dr.
The range of chapter topics includes dopant diffusion, silicides, rapid thermal processing, atomic layer deposition, yield modeling, yield management, failure analysis, and factory modeling.
Arradiance today unveiled the GEM-D2 Atomic Layer Deposition (ALD) system in advance of the American Vacuum Society's annual Atomic Layer Deposition Meeting in Monterey, CA.
Contract notice: Supply and installation of a growth reactor for atomic layer deposition in the cipac laboratory ensicaen.
Technical leaders from corporations around the world present papers on interconnect performance, low-dielectric constant materials, barrier metallization, atomic layer deposition, advanced packaging, and vertical integration.