atomic layer deposition


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atomic layer deposition

A semiconductor manufacturing technique that deposits a single layer on a chip that is only one atom or one molecule thick. As elements on a chip decreased to below 100 nm, this essential technology for making the chip ever smaller became commercial after the turn of the 21st century. For example, Applied Materials introduced its first atomic layer deposition chamber in 2001.
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Solar equipment company Amtech Systems Inc (NASDAQ:ASYS) revealed on Thursday that it has received a follow-on order for three next generation solar Atomic Layer Deposition (ALD) systems.
It is said to be especially suited in plasma deposition applications such as atomic layer deposition and chemical vapor deposition, as well as etch processes used to fabricate next-generation chips in the semiconductor industry.
It consists of multiwalled carbon nanotubes functionalized with a zinc oxide nanocrystal layer formed by atomic layer deposition, and works in conjunction with a Gaussian plume triangulation algorithm that can precisely detect the location of a methane leak and estimate its mass emission rate.
They describe organometallic chemistry methods, including surface organometallic chemistry, molecular metal complex catalysts within zeolites, heteronuclear complexes or clusters as precursors of supported bimetallic nanoparticles, and atomically precise nanoclusters in gold catalytic applications; physical methods (monolayer electro-deposition techniques and atomic layer deposition in the vapor phase); the preparation and characterization of model catalysts for hydrogen chloride oxidation reaction; advanced electrocatalysts; and atom probe microscopies.
3 ( ANI ): Researchers in Georgia have created a new way to produce better films using atomic layer deposition that will safeguard your phone's high-tech organic light-emitting diode (OLED) display from every whiff of oxygen or molecule of water vapor.
The ability to deposit layers of material only a few nanometers thick on a surface is known as atomic layer deposition (ALD).
So the gallium nitride thin films deposited over silica nanosprings by atomic layer deposition method should have variety of applications in the sensing field as well as in the optoelectronics.
An atomic layer deposition technique was used to control the thickness.
NLD is a process technology that bridges the gap between high throughput, non-conformal chemical vapor deposition (CVD) and highly conformal, low throughput atomic layer deposition (ALD).
In addition, 26 (of 80) poster papers consider such topics as comparing ZnS-based buffer layers by chemical bath deposition and atomic layer deposition, hydrogen diffusion in zinc oxide thin films, characterizing indium sulfide thin films containing copper, and chemically and electrochemically deposited thin films of tin sulfide for photovoltaic structures.
In the deposition industry, advances in separation by implantation of oxygen (SIMOX), atomic layer deposition (ALD) for advanced nodes, and plasma source ion implantation (PSII) are expected for meeting the specific needs of sub-100 nm devices.
Further patent protection announced for nanofilm electron resistive and emissive coatings deposited by Atomic Layer Deposition that increase lifetime, detector area and gain to levels unattained by conventional methods.