dry plasma etching

dry plasma etching

[¦drī ′plaz·mə]
(electronics)
McGraw-Hill Dictionary of Scientific & Technical Terms, 6E, Copyright © 2003 by The McGraw-Hill Companies, Inc.

dry plasma etching

A method for inscribing a pattern on a wafer by shooting hot ions through a mask to evaporate the silicon dioxide insulation layer. Dry plasma etching replaces the wet processing method that uses film and acid for developing the pattern.
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