electron beam lithography


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electron beam lithography

Using electron beams to create the mask patterns directly on a chip. The wavelength of an electron beam is only a few picometers compared to the 248 to 365 nanometer wavelengths of light used to create the traditional photomasks.


Magnified 35,000 Times
The tiny lines on this silicon wafer were created using Lucent's SCALPEL electron beam lithography. The right-leaning lines are .08 microns wide. It would take 1,250 of them to equal the width of one human hair. (Image courtesy of Lucent Technologies.)
References in periodicals archive ?
The Vistec EBPG5200 is the latest version of the highly successful EBPG5000plus electron beam lithography system technology.
Vistec EBPG5200 system users benefit from more than thirty years of experience that Vistec has gained in the electron beam lithography business.
These tools include the ALTA 3000 and MEBES 4500 advanced laser and electron beam lithography systems, and ORBOT RT-8000 and KLA 351 with STARlight inspection systems, which will clearly establish the facility as the world's premier photomask manufacturing site.
Beyond its new imaging and analytical performance, the NOVA NanoSEM 30 series also provides researchers with novel prototyping capabilities based on electron beam lithography, electron beam induced deposition and in-situ experimentation for manipulation and testing.
Contract notice: Supply of Electron beam lithography system.
Installation of the Company's sixth ETEC Electron Beam Lithography System.
com), a developer of electron beam lithography systems for the worldwide semiconductor industry, has selected Grant Technologies (www.
The contract is the supply of equipment for removing resist after etching processes, especially UV and electron beam lithography.
Two important tools that will help accomplish these goals are the MEBES 4500 electron beam lithography system and the Orbot RT 8000 Inspection system.
from Princeton University, Warren Grobman served IBM as a research scientist, led the company's electron beam lithography effort, started the synchrotron X-ray lithography program, was head of the Semiconductor Technology Development Laboratory and program director for the GaAs joint program with IBM Fishkill and Rockwell International, and was program director of technology modeling.
A related paper jointly authored by Advantest, D2S, e-Shuttle and Fujitsu Microelectronics Limited will be presented by e-Shuttle at the session of Electron Beam Lithography Tools during the 53rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN), taking place May 26-29 in Marco Island, Fla.

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