electron-beam lithography


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electron-beam lithography

[i′lek‚trän ‚bēm li′thäg·rə·fē]
(electronics)
Lithography in which the radiation-sensitive film or resist is placed in the vacuum chamber of a scanning-beam electron microscope and exposed by an electron beam under digital computer control; after exposure, the film is removed from the vacuum chamber for conventional development and other production processes.
McGraw-Hill Dictionary of Scientific & Technical Terms, 6E, Copyright © 2003 by The McGraw-Hill Companies, Inc.
References in periodicals archive ?
"Tiny Alice" was created using a cutting-edge technology known as electron-beam lithography at Cardiff University's Institute of Compound Semiconductors.
Electron-beam lithography (e-beam) differs fundamentally from the previously described optical laser technologies because it uses an electron beam, rather than a laser beam.
Low-temperature curing is unconventional in electron-beam lithography and PMMA typically shows low resistance to oxygen plasma etching [33].
Along the way, I utilize an assortment of programs and skills, such as Python, LabVIEW, electron-beam lithography, atomic force microscopy, and much more."
The machine resources section allows users to graphically create complex electron-beam lithography (EBL) job and schedule files.
Designed for rapid prototyping of high-quality nanostructures, SwissLitho's NanoFrazor exceeds resolution capabilities of standard technologies, such as electron-beam lithography. A heatable tip is used to create arbitrary, 3-D high-resolution nanostructures with a lateral resolution below 10-nm half pitch.
Their topics include the green synthesis of silver nanoparticles using Momordica charantia (bitter melon) fruit extracts, an in-house approach for fabricating poly-silicon nanobiosensors using a conventional photolithography and etching method, photovoltaic properties of dye-sensitized solar cells using novel aligned zinc oxide nanorod arrays on a catalyst doped with tin and seeded with zinc oxide with different aspect ratios, optimizing linear oxide width using local anodic oxidation lithography for fabricating semiconductor and metal nanowires, and a fundamental study of electron-beam lithography beyond the sub 100 nanometer process and its application.
In order to achieve feature sizes that cannot be obtained through conventional photolithography, nano-bioengineers have reached for advanced manufacturing techniques, everything from x-ray lithography, deep reactive-ion etching, and electron-beam lithography to scanning-probe lithography, two-photon polymerization, pulsed laser deposition, and focused ion beam lithography.
For this technique, metal gratings with dimensions in the 100nm range are patterned next to ridge structures in semiconductor material using electron-beam lithography. The grating structure acts as a filter for the DFB laser's resonator modes, allowing only one frequency/wavelength to pass with low loss.
TELECOMWORLDWIRE-March 26, 2012-Micronova selects Vistec's electron-beam lithography system(C)1994-2012 M2 COMMUNICATIONS http://www.m2.com
A template was created using electron-beam lithography, and a thin layer of aluminum oxide was added on top of that using atomic layer deposition.

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