(4) Film thickness and refractive index measured using Ellipsometer
. TABLE 2.
Delegation was briefed about metrology grade spectroscopic ellipsometer
, electro physical process reliability and such other machines.
They were given a briefing about a metrology grade spectroscopic ellipsometer
, electro physical process reliability and other machines.
The thickness of the titania films was measured using Filmetrics F20 thin-film analyzer and VASE Ellipsometer
VB-400 (Figure S1, Supporting Information).
The thickness of the applied coatings on the glass substrate has been determined by an ellipsometer
. The data were acquired and analyzed by using the WVASE32 (ex situ) and CompleteEASE (in situ/ex situ) software.
The Ti[O.sub.2] film's thickness of 84 nm was measured by using an ellipsometer
The optical C[O.sub.2] gas detection experiments were carried out by measuring the transmission signals in a normal incident configuration of a variable-angle ellipsometer
at room temperature.
Spectroscopic ellipsometry (SE) measurements were performed by a Jobin Yvon UVISEL-NIR phase modulated spectroscopic ellipsometer
apparatus, at an angle of incidence of 65[degrees] over the range 300-1600 nm with a resolution of 5 nm.
Analyses were mainly carried out by reflection analysis (by ultraviolet-visible spectroscopy, Lambda 750 UV/VIS Spectrometer, Perkin Elmer, Waltham, MA, USA) and ellipsometer
(UviselErAgms-nds, Horiba Jobin Yvon, Kyoto, Japan) and finally by the performance of the fabricated silicon solar cells with or without ARC.
PHE-102 Spectroscopic Ellipsometer
(250-2300 nm) was used to measure thicknesses of the films.
(UVISEL-NIR, Horiba JobinYvon) was used to measure the film thickness.