Ltd., Germany, 65%), tin (II) chloride (Sn[Cl.sub.2], Wako Pure Chemical Industries, Ltd., Japan, 97.0%), indium chloride
(In[Cl.sub.3], Alfa Aesar.
The deposition of transparent contact of ZnO:In was realized for dip coating method, using zinc acetate dehydrate, 2-methoxiethanol, monoethanolamine (MEA), and indium chloride
as source solutions.
Sn[O.sub.2]: [In.sub.2][O.sub.3] thin films were deposited by the chemical spray pyrolysis technique from aqueous solutions containing tin chloride pentahydrate and indium chloride
with molarities (0.1M) as a precursor using compressed air at pressure 1 bar as a carrier gas.
The small exothermic peaks correspond to the loss of chains of the porphyrin ring and the large exothermic peaks in the DTA curve at around 650[degrees] C correspond to the collapse of the porphyrins skeleton and the indium chloride
moiety as well.
To incorporate doping of [In.sub.3+], indium chloride
(0.01M) was mixed with lead nitrate or cadmium nitrate.
Then we realized that someone in the lab had solvent bottles open." Fumes from the chlorinated solvents, reacting with the ultraviolet light used to clean the ITO, had deposited a thin layer of indium chloride
on the ITO surface.
A three-electrode electrochemical cell (see Figure 2) containing an ethylene glycol (organic solvent) bath of sulfur S (precipitated, 99.5%), sodium thiosulfate [Na.sub.2][S.sub.2][O.sub.3] x 5[H.sub.2]O (99+%), indium chloride
In[Cl.sub.3] (anhydrous, 99.99%, metal basis), and sodium chloride NaCl (metal basis, 99.99%) from Alfa Aesar was used to conduct experiments with three different compositions as shown in Table 1.
[In.sub.2][S.sub.3] thin films were prepared by spraying a solution containing indium chloride
and thiourea in the ratio 1.2: 12 at a spray rate of 6 mL/min onto a substrate maintained at 350[degrees]C.