metal-organic chemical vapor deposition
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metal-organic chemical vapor deposition[′med·əl ȯr′gan·ik ′kem·ə·kəl ′vā·pər ‚dep·ə′zish·ən]
A technique for growing thin layers of compound semiconductors in which metal organic compounds, having the formula MRx , where M is a group III metal and R is an organic radical, are decomposed near the surface of a heated substrate wafer, in the presence of a hydride of a group V element. Abbreviated MOCVD.