optical lithography


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Related to optical lithography: Electron beam lithography

optical lithography

[′äp·tə·kəl li′thäg·rə·fē]
(electronics)
Lithography in which an integrated circuit pattern is first created on a glass plate or mask and is then transferred to the resist by one of a number of optical techniques by using visible or ultraviolet light.
References in periodicals archive ?
Compared with conventional optical lithography equipment, nanoimprint lithography delivers greatly reduced production costs for semiconductor devices, responding to the high-level demands of semiconductor manufacturers seeking to reduce CoO for high-resolution semiconductor devices.
Furthermore, the device is required for applying and developing mainly organic layers for electron and optical lithography.
The consultation for the provision of an optical lithography system comprising an exposure system for Wafer 4 "and a laser system maskless lithography.
Prior Information Notice: Supply of Optical lithography