photoresist


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Related to photoresist: photolithography

photoresist

[′fōd·ō·ri‚zist]
(graphic arts)
A light-sensitive coating that is applied to a substrate or board, exposed, and developed prior to chemical etching; the exposed areas serve as a mask for selective etching.
McGraw-Hill Dictionary of Scientific & Technical Terms, 6E, Copyright © 2003 by The McGraw-Hill Companies, Inc.
The following article is from The Great Soviet Encyclopedia (1979). It might be outdated or ideologically biased.

Photoresist

 

a photosensitive polymer coating applied to the surface of a semiconductor plate with an oxide film. Photoresists are used in semiconductor electronics and microelectronics to produce areas of a specific configuration that permit access of an etching agent onto the plate.

The properties of a photoresist are altered on exposure to ultraviolet light or an electron beam through a glass template of the required configuration applied to the photoresist. Either the solubility of the photoresist is sharply reduced (in the case of a negative photoresist), or the photoresist is decomposed and may be easily removed (in the case of a positive photoresist). Subsequent treatment with a solvent forms the access areas in the nonirradiated segments of a negative photoresist or in the irradiated segments of a positive photoresist. Negative photoresists consist of layers of polyvinyl alcohol with chromates or cinnamic acid esters and layers of cyclized rubber with additives that produce crosslinking of the macromolecules under the action of light. Positive photoresists consist of a phenol-formaldehyde or cresol-formal-dehyde resin with ortho-naphthoquinone diazide.

REFERENCES

Fotolitografiia i optika. Moscow-Berlin, 1974.
Mazel’, E. Z., and F. P. Press. Planarnaia tekhnologiia kremnievykh priborov. Moscow, 1974.
The Great Soviet Encyclopedia, 3rd Edition (1970-1979). © 2010 The Gale Group, Inc. All rights reserved.

photoresist

A film used in photolithography that temporarily holds the pattern of a circuit path or microscopic element of a chip. When exposed to light, it hardens and is resistant to the acid bath that washes away the unexposed areas. Not to be confused with photoresistor.
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References in periodicals archive ?
In photoresists, Samsung is trying to curb its reliance on Japan for advanced material, although sources say it faces high hurdles.
Nowadays, the world's photoresist market is firmly monopolized by multinational giants such as JSR, TOK, DOW, Fujifilm, Shin-Etsu Chemical, Dongjin Semichem, Merk, and Eternal Materials.
Still, the anticipation of localization has lifted the stock price of local firms that produce photoresist. For instance, the Dongjin Semichem shares rose 63 percent to 16,450 won on Tuesday from 10,050 won on July 28.
The technique does not use diffractive dots and directly writes 3D structures using a focused high-energy beam (not e-beam) into a proprietary photoresist plate.
The solubility of the binder polymer in the PGMEA, a common solvent in the photoresist, was also examined.
Technavio's report, Global Semiconductor Photoresist Stripping Market 2016-2020, has been prepared based on an in-depth market analysis with inputs from industry experts.
This order is important because it is optimal to pattern features with nanoscale vertical dimensions in a planar film of photoresist, coated conformally over an unpatterned substrate.
The Semiconductor Research Consortium has provided support to investigate a hinderance in the progression of this technology: the need for photoresists that can polymerize at EUV wavelengths in the range of 13.5 nm.
The system uses a spray mechanism to coat photoresist and protective layers, enabling it to achieve highly uniform coverage of stepped areas, which was extremely difficult with conventional systems.
The photoresist is spun coating on the substrate to form microlense array and then the light outcoupling results of organic device are discussed with normal and the modified substrate.
It is after this that, waveguide patterns are transferred with specific width to a photoresist layer by using standard photolithography and dry etching to define waveguide structure on polysilicon layer.