photoresist

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photoresist

[′fōd·ō·ri‚zist]
(graphic arts)
A light-sensitive coating that is applied to a substrate or board, exposed, and developed prior to chemical etching; the exposed areas serve as a mask for selective etching.
McGraw-Hill Dictionary of Scientific & Technical Terms, 6E, Copyright © 2003 by The McGraw-Hill Companies, Inc.
The following article is from The Great Soviet Encyclopedia (1979). It might be outdated or ideologically biased.

Photoresist

 

a photosensitive polymer coating applied to the surface of a semiconductor plate with an oxide film. Photoresists are used in semiconductor electronics and microelectronics to produce areas of a specific configuration that permit access of an etching agent onto the plate.

The properties of a photoresist are altered on exposure to ultraviolet light or an electron beam through a glass template of the required configuration applied to the photoresist. Either the solubility of the photoresist is sharply reduced (in the case of a negative photoresist), or the photoresist is decomposed and may be easily removed (in the case of a positive photoresist). Subsequent treatment with a solvent forms the access areas in the nonirradiated segments of a negative photoresist or in the irradiated segments of a positive photoresist. Negative photoresists consist of layers of polyvinyl alcohol with chromates or cinnamic acid esters and layers of cyclized rubber with additives that produce crosslinking of the macromolecules under the action of light. Positive photoresists consist of a phenol-formaldehyde or cresol-formal-dehyde resin with ortho-naphthoquinone diazide.

REFERENCES

Fotolitografiia i optika. Moscow-Berlin, 1974.
Mazel’, E. Z., and F. P. Press. Planarnaia tekhnologiia kremnievykh priborov. Moscow, 1974.
The Great Soviet Encyclopedia, 3rd Edition (1970-1979). © 2010 The Gale Group, Inc. All rights reserved.

photoresist

A film used in photolithography that temporarily holds the pattern of a circuit path or microscopic element of a chip. When exposed to light, it hardens and is resistant to the acid bath that washes away the unexposed areas. Not to be confused with photoresistor.
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References in periodicals archive ?
Samsung, for instance, has stepped up testing of non-Japanese photoresists and hydrogen fluoride, several sources familiar with the chip supply chain said.
According to the Korea International Trade Association, South Korea imported about 92 percent of photoresists and 43.9 percent of hydrogen fluoride from Japan.
Caption: Figure 8: The optical microscopic images of black PDL patterns obtained with (a) PT-0, (b) PT-1, (c) PT-2, and (d) PT-3 black photoresists.
Technavio's analysts forecast the global semiconductor photoresist stripping market to grow at a CAGR of 3.13% during the period 2016-2020.
Fujifilm, while focusing on the development, production and sale of photoresists, developers, cleaners, CMP slurries and other enabling chemistries for use in semiconductor fabrication, also manufactures and sells high purity solvents.
Polymer based chemically amplified photoresists have historically been used with great success but are limited in the EUV range.
Therefore, the goal of this work was to create a diffraction grating with new properties by the modification of photoresist with Ag nanoparticles prepared by the Lee-Meisel method and to investigate the influence of the nanoparticles content on the morphology and optical properties of the grating.
But microstructures are often fabricated on photoresist layer as well as on silicon substrate.
This flow sensor offers flow rates below 2.0 cc/sec (120 ml/min) with hydrocarbon-based liquids, such as photoresists and solvents.
He explains the reasons and principles behind the techniques used and covers the metrics of lithography, hardware components, immersion lithography, successors to optical lithography, and principles of photoresists, processing windows, phase-shifting masks, off-axis illumination, proximity correction, EUV lithography, and multiple e-beam maskless lithography.
Outgassing from photoresists illuminated by extreme ultraviolet radiation can lead to degradation of the very expensive multilayer-coated optics in an extreme ultraviolet stepper.
Applications include analysis of self-assembled monolayers on gold and thin photoresists on silicon.