plasma etching


Also found in: Wikipedia.

plasma etching

[′plaz·mə ′ech·iŋ]
(electronics)
A method of forming integrated-circuit patterns on a surface, in which charged species in a plasma formed above a masked surface are directed to impact the nonmasked regions of the surface and knock out substrate atoms. Also known as dry plasma etching.
References in periodicals archive ?
The object of the contract is an icp-rie plasma etching system for proportional and binary plasma etching in dielectric, Semiconducting and metallic materials and functional layers (fused silica, Silicon, Sioxny, Silicon carbide, High-breaking materials such as ta2o5, Nb2o5, Etc.
Plasma Etching Technology is a total, cost-effective, safe, and environmentally-sound solution to many of the surface preparation problems faced by manufacturers using the latest materials.
Ranson, CNRS-University d'Orleans; and "Development and characterization of imprint-resists as masks for plasma etching," C.
NIST scientists have recently developed and validated a model for predicting the kinetic energy of ions in plasma etching reactors used by the semiconductor industry.
In plasma etching, a technician mounts a silicon wafer inside a vacuum chamber and injects a gas.
The program includes presentations on plasma-surface interaction, plasma diagnostics, plasma etching for interconnects, post-etch strip and clean and deep plasma etching at the state of the art.
Contract notice: Delivery, Installation, Commissioning and final acceptance of a plasma etching system for the semiconductor laboratory of the max planck society.
The Tegal 981ACS is the latest in a series of diode plasma etch systems produced by Tegal, the industry pioneer in commercial single-wafer plasma etching.
The Tegal 901ACS is the latest in a series of capacitively coupled diode plasma etch systems produced by Tegal, the industry pioneer in commercial single-wafer plasma etching.
The Tegal 915 is one of a series of diode and batch plasma etch systems produced by Tegal, the industry pioneer in commercial single-wafer plasma etching.
NASDAQ:TRKN), a technology leader of plasma etching and deposition systems for the global semiconductor industry, today announced the closing of their consolidation through merger.